Wet Processing
Advancer Immersion Wet Bench
Advancer Immersion Wet Bench for sale. Flexible configurations that provide effective solutions to many wet process...
INFOWet Processing solutions including spin cleaning machines, immersion wet benches, water delivery systems and post CMP scrubbers.
Advancer Immersion Wet Bench for sale. Flexible configurations that provide effective solutions to many wet process...
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Chemical Delivery System for sale. MEI delivers 3 different Chemical Delivery Systems: FlexChem, MultiChem, and DrumChem....
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RENA NA Spin Rinse Dryer offers advanced Software Controls with high-quality Hardware (control of vibrations, cleanliness,...
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RENA’s Electroplating EPM 2 is a compact electro-plating system for semiconductor device manufacturing and packaging applications.
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Evolution Immersion Wet Bench for sale. Full-Auto Wet Bench is an in-line, configurable, automated, modular, linear...
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RENA’s Genesis Marangoni Dryer integrates drying with cleaning and rinsing, providing a one-step process for several applications.
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Inception Single Wafer Processing Tool from Rena: Clean, Etch, Strip, and Dry – Enabling the Transition...
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Revolution Immersion Wet Bench for sale. Robust rotary robots can handle carriers up to 300 mm...
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MEI’s VaporDry, Integrated IPA Drying Process displaces water from high aspect ratio features and TSV, effectively drying the...
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Cassette-to-cassette stand-alone 3–6″ linear double-side PVA scrubber.
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Manual loading, automated post-CMP scrubber for 4–12″ wafers.
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Manual loading, automated post-CMP single-chamber scrubber for 4–12″ wafers.
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Cassette-to-cassette stand-alone 8-12″ linear double-side PVA scrubber.
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Semi-Automatic Single Wafer Cleaner that sequentially performs five cleaning processes and allows for full customization.
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Post-CMP scrubber with the possibility of simultaneous scrubbing of two wafer sizes (up to 200 mm),...
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Double-sided PVA scrubber for 100 mm to 200 mm wafers.
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Double-sided PVA scrubber for 100 mm to 200 mm wafers.
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Double-sided PVA scrubber for 100 mm to 200 mm wafers.
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Manual loading automatic 4-12″ single-wafer spin cleaning system.
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Manual loading 3-12″ single-wafer spin Cleaning machine.
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