By RENA
Supplier InfoProduct Type:
Equipment
Application:
Wet Processing
Product Description:
Inception – Single wafer processing tool
RENA Inception, the compact semi-automated single-wafer processing system is an ideal solution for wet chemical cleaning, etching, and resist-tripping processes. This platform enables the transition from R&D to pilot production in semiconductor manufacturing. Inception can be applied for acid applications in FEoL as well as solvent applications in BEoL. It provides superior etch uniformity <= 1% within the wafer, from wafer to wafer, and from lot to lot.
Inception consists of Dual moving spray arms with separate chemical lines which together with multiple tank designs provide multi-step processing features. A variation of chucks is available for different wafer and substrate sizes to allow easy setup for different applications.
RENA’s IDX Flexware software provides many advantageous features for process control and monitoring. All RENA systems are compliant with the SECS/GEM interface of the factory host.
Features and Benefits
- Wafers up to 200 mm and masks up to 7 x 7
- Etch uniformity exceeds batch systems
- Manual or automated wafer handling
- Single or dual load port
- 2 to 4 chemical process tanks
- Hyperaccurate concentration controls (ABB, Horiba, CI Semi)
- Hyperaccurate spiking capability (Chemical & DI)
- Automatic chemical compensation for losses
- Small footprint
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