Product Type: Equipment
Application: Wet Processing
The NDS Wafer Cleaner series is designed for automatic cleaning of semiconductor wafers from 4″ to 12″ with a reliable and efficient cleaning process. The systems feature an atomizing cleaning nozzle, a stage made of porous metal to fix the wafers and PLC control with a convenient touch panel for precise process operation. Adjustable cleaning time and revolution speed provide flexible process control and enable consistent cleaning performance for different wafer processing requirements.
NDS offers three Wafer Spin Cleaner:
- NDS 412: Table applicable to 12 inch
- NDS 408: Table applicable to 8 inch
- NDS 406: Table applicable to 6 inch
NDS 412/408/406 Spin Cleaner is providing:
- Automatic cleaning with atomizing cleaning nozzle
- Stage made of porous metal to fix the wafers
- A range of cleaning time from 5 to 999 s
- Possibility to run from 4″ to 12″ wafers
- PLC with touch panel to set up recipes
- Range of spinning from 400 to 2800 RPM with different levels of speed adjustment
See the attached file for the technical specifications.
file_downloadNDS-Auxiliary-Equipment.pdf
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Manual Spin System for R&D cleaning applications