by FEMTO SCIENCE Inc.
Dry Processing
S3 Alliance offers advanced dry processing solutions, including dry etch, ashing, CO2 dry cleaning, and laser cleaning. Benefit from our expertise, reliability, and innovative technology for your dry processing needs.
by FEMTO SCIENCE Inc.
Dry Processing & UHP
VITA 12 Reactive Ion Etch System
Patented gas delivery system for 12-inch wafers, 13.56 MHz RF generator, and intuitive touch controls.
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by FEMTO SCIENCE Inc.
Dry Processing & UHP
VITA 8 Reactive Ion Etch System
Patented gas delivery system for 8-inch wafers, 13.56 MHz RF generator, and intuitive touch controls.
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by ESI
Dry Processing & UHP
e3611 Single Wafer Plasma Ashing System
Single chamber with 2 cassette stations and single-arm robot Asher.
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by ESI
Dry Processing & UHP
e3612 Single Wafer Plasma Ashing System
Two chambers with 2 cassette stations and dual-arm robot Asher.
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by IMT
Dry Processing & UHP
400P-M Probe Card Cleaner
Probe Card Cleaner, a dry cleaning system for semiconductor probe cards using advanced laser technology.
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by IMT
Dry Processing & UHP
C1100 CO2 Cleaning System
Efficient removal of contaminants from semiconductor wafers.
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by IMT
Dry Processing & UHP
C2200 Automatic CO2 Jet Surface Cleaner
PCB, tray and glass contaminant removal featuring a cassette loading-unloading system.
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by IMT
Dry Processing & UHP
C3100 Automatic CO2 Filmframe Wafer Cleaning Syste...
Automated CO2 system for efficient and precise filmframe wafer cleaning.
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by IMT
Dry Processing & UHP
DANDI 3100 CO2 Wafer Cleaning System
Based on a CO2 Gas/Snow Jet, it removes fine particles, improves defectivity, and offers fast throughput
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