For the Semiconductor / MEMS area
we offer a wide range of high-performance equipment designed to meet the specific demands of modern manufacturing. Whether you’re optimizing production efficiency or enhancing precision, our cutting-edge technologies provide reliable support for your industrial needs. Discover the tools that will take your operations to the next level.

choose your area of interest

CMP
Example image for CMP: Capstone CS200-ma. CMP system of Axus Technology.
Wet Processing
Example image for Wet Processing: Inception Single Wafer Processing Tool from RENA.
Dry Processing
Example image for Dry Processing: C1100 CO2 Cleaning System from IMT.
Deposition
Example image for Deposition: PRISM-400 Benchtop Ultrasonic Spray Coating System from USI
CMP Remanufactured
Product image of Surface / IPEC 472 fully automated wafer polisher from Axus as an example image for remanufactured CMP Equipment.
DI Water Heater
Example image for DI Water Heater: Quantum NXT™ Ultra-Pure Water Heater from Trebor.
(De-)Taping, Mounting, Curing
Example image for (De-)Taping, Mounting, Curing: 300 mm Wafer Mounter EXM 1200 UVR V20 from Teikoku
Critical Point Dryer
Example image for Critical Point Dryer. CPD 931 from Tousimis.
Scribing
Example image for Scribing: DTX-200 scribe & break system from 4Jet.
Grinding/Dicing
Example image for Grinding / Dicing: NANO 320 automatic Dicing Saw from NDS
Others
Example image for other equipment: Wafer Expander DXE-582 from Dynatex

new products here:

400P-M Probe Card Cleaner
400P-M Probe Card Cleaner
400P-M Probe Card Cleaner
Quantum NXT-R Recirculation Ultra-Pure Water Heater
Quantum NXT-R Recirculation Ultra-Pure Water Heater
Quantum NXT-R Recirculation Ultra-Pure Water Heater
ZEUS Wafer Cleaning System
ZEUS Wafer Cleaning System
ZEUS Wafer Cleaning System
C2200 Automatic CO2 Jet Surface Cleaner
C2200 Automatic CO2 Jet Surface Cleaner
C2200 Automatic CO2 Jet Surface Cleaner
C1100 CO2 Cleaning System
C1100 CO2 Cleaning System
C1100 CO2 Cleaning System
C3100 Automatic CO2 Filmframe Wafer Cleaning System
C3100 Automatic CO2 Filmframe Wafer Cleaning System
C3100 Automatic CO2 Filmframe Wafer Cleaning System
DANDI 3100 CO2 Wafer Cleaning System
DANDI 3100 CO2 Wafer Cleaning System
DANDI 3100 CO2 Wafer Cleaning System