Deposition
PRISM-400 BT (Benchtop) Ultrasonic Spray Coating S...
Leverages USI’s proprietary nozzle-less ultrasonic spray head and is designed for R&D Requirements.
INFOS3 Alliance offers advanced deposition tools for PECVD, ALD, and ultrasonic spray technology, tailored to your specific needs.
Benefit from our expertise, reliability, and innovative solutions for your deposition processes.
Leverages USI’s proprietary nozzle-less ultrasonic spray head and is designed for R&D Requirements.
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Nozzle-less ultrasonic technology enables a more precise coating process on substrates up to 500 mm wide.
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Nozzle-less ultrasonic technology enables a more precise coating application up to 800 mm square substrates.
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Vertical Furnace Batch ALD for up to 12″ wafers (boat with up to 100 wafers), up...
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Showerhead Thermal ALD reactor for 4 to 12″ wafers, up to 500°C (Plasma Process available).
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Nano-powder coating ALD with 100cc to 500cc reactor volume, up to 300°C.
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