S3 Alliance offers advanced deposition tools for PECVD, ALD, and ultrasonic spray technology, tailored to your specific needs.
Benefit from our expertise, reliability, and innovative solutions for your deposition processes.
Ultrasonic Spray Coating System leverages USI’s proprietary nozzle-less ultrasonic spray head and is designed for R&D...
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PRISM-500 systems leverage USI’s proprietary nozzle-less ultrasonic technology which delivers a more precise coating application up...
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PRISM-800 systems leverage USI’s proprietary nozzle-less ultrasonic technology which delivers a more precise coating application up...
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Vertical Furnace Batch ALD for up to 12″ wafers (boat with up to 100 wafers), up...
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Showerhead Thermal ALD reactor for 4 to 12″ wafers, up to 500°C (Plasma Process available).
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Nano-powder coating ALD with 100cc to 500cc reactor volume, up to 300°C.
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Compact Spin Coater for Samples and wafers up to 6″. Simple operation.
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Compact Spin Coater for Samples and Wafer up to 8″. Simple operation.
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The smallest and most flexible full production cluster system on the market.
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The Orion Plasma Enhanced Chemical Vapor Deposition System produces production-quality films on a compact platform. The...
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