by AXUS
CMP, Wet Processing
Aquarius™ A200-sa Wafer Cleaner
Post-CMP scrubber with the possibility of simultaneous scrubbing of two wafer sizes (up to 200 mm),...
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CMP
S3 Alliance provides a selection of CMP machines, customized to meet your R&D or production needs.
by AXUS
by AXUS
CMP
Crystal Carrier upgrade
Carrier upgrade with Axus advanced 4-zone membrane carrier for ultra-thin or fragile wafers.
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by AXUS
CMP
Gemini-3 Dual Slurry / Cleaning Chemistry Delivery...
Dual slurry/cleaning chemistry delivery system.
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by AXUS
CMP, Wet Processing
OnTrak DSS-200 Series 1 Post CMP Scrubber
Double-sided PVA scrubber for 100 mm to 200 mm wafers.
INFO
by AXUS
CMP, Wet Processing
OnTrak DSS-200 Synergy™ Post CMP Scrubber
Double-sided PVA scrubber for 100 mm to 200 mm wafers.
INFO
by AXUS
CMP, Wet Processing
OnTrak DSS200 Series 2 Post CMP Scrubber
Double-sided PVA scrubber for 100 mm to 200 mm wafers.
INFO
by AXUS
CMP
AXUS CMP Foundry Service
Advanced CMP process development up to standard production foundry.
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by GNP
CMP
CMP POLI 610
CMP equipment for hard and inert wafers, high down-force, up to 2 heads, and up to...
INFO
by GNP
CMP
CMP POLI 762
Intelligent CMP equipment designed for high versatility for 12″ (300 mm) wafers.
INFO
by GNP
by GNP
CMP, Wet Processing
Post CMP Scrubber 326L
Cassette-to-cassette stand-alone 3–6″ linear double-side PVA scrubber.
INFO
by GNP
CMP, Wet Processing
Post CMP Scrubber 412RL
Manual loading, automated post-CMP scrubber for 4–12″ wafers.
INFO
by GNP
CMP, Wet Processing
Post CMP Scrubber 412S
Manual loading, automated post-CMP single-chamber scrubber for 4–12″ wafers.
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by GNP
CMP, Wet Processing
Post CMP Scrubber 812L
Cassette-to-cassette stand-alone 8-12″ linear double-side PVA scrubber.
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by GNP
CMP
R&D CMP POLI 400
Manual loading, automated single-spindle, single-table 150 mm CMP equipment.
INFO
by GNP
CMP
R&D CMP POLI 500
Manual loading, automated single-spindle, single-table 200 mm CMP equipment.
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