by GNP
CMP, Wet Processing
ZEUS Wafer Cleaning System
Semi-Automatic Single Wafer Cleaner that sequentially performs five cleaning processes and allows for full customization.
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GNP
by GNP
by GNP
CMP, Wet Processing
Post CMP Scrubber 812L
Cassette-to-cassette stand-alone 8-12″ linear double-side PVA scrubber.
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by GNP
CMP, Wet Processing
Post CMP Scrubber 326L
Cassette-to-cassette stand-alone 3–6″ linear double-side PVA scrubber.
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by GNP
CMP, Wet Processing
Post CMP Scrubber 412S
Manual loading, automated post-CMP single-chamber scrubber for 4–12″ wafers.
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by GNP
CMP, Wet Processing
Post CMP Scrubber 412RL
Manual loading, automated post-CMP scrubber for 4–12″ wafers.
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by GNP
CMP
CMP POLI 762
Intelligent CMP equipment designed for high versatility for 12″ (300 mm) wafers.
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by GNP
CMP
CMP POLI 610
CMP equipment for hard and inert wafers, high down-force, up to 2 heads, and up to...
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by GNP
CMP
R&D CMP POLI 500
Manual loading, automated single-spindle, single-table 200 mm CMP equipment.
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by GNP
CMP
R&D CMP POLI 400
Manual loading, automated single-spindle, single-table 150 mm CMP equipment.
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