by CN1
Compact reactor Thermal ALD

Deposition


Atomic Basic


Compact thermal ALD reactor for up to 6″ wafers, up to 250°C.

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by CN1
Vertical Furnace Batch ALD

Deposition


Atomic Mega


Vertical Furnace Batch ALD for up to 12″ wafers (boat with up to 100 wafers), up...

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by CN1
Nano-Powder Coating ALD

Deposition


Atomic Shell


Nano-powder coating ALD with 100cc to 500cc reactor volume, up to 300°C.

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by CN1
showerhead Type ALD Process

Deposition


Atomic Premium


Showerhead Thermal ALD reactor for 4 to 12″ wafers, up to 500°C (Plasma Process available).

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