by CN1
Compact reactor Thermal ALD

Deposition

Atomic Basic

Compact thermal ALD reactor for up to 6″ wafers, up to 250°C.

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by CN1
Vertical Furnace Batch ALD

Deposition

Atomic Mega

Vertical Furnace Batch ALD for up to 12″ wafers (boat with up to 100 wafers), up...

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by CN1
Nano-Powder Coating ALD

Deposition

Atomic Shell

Nano-powder coating ALD with 100cc to 500cc reactor volume, up to 300°C.

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by CN1
showerhead Type ALD Process

Deposition

Atomic Premium

Showerhead Thermal ALD reactor for 4 to 12″ wafers, up to 500°C (Plasma Process available).

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