Atomic Premium

Product Type:

Equipment

Application:

Deposition

Product Description:

Atomic Premium

Showerhead ALD reactor for wafer sizes up to 12″ and process temperatures up to 500°C. Excellent conformality and uniformity for a deep trench with high aspect ratio and complex 3D nano- & micro-structures.

Showerhead Type ALD Process

• Substrate Size: 4–12” Standard (Wafer)
• Thermal ALD Process (Plasma Process Available)
  
• Chamber Material: anodized Al6061
  
• Adjustable Gap between Showerhead and Substrate
  
• Gas Delivery System: Bubbler, LDS, etc.
  
• Max Temperature: 500℃ (@ Wafer)
  
• No. of Precursor Canisters: up to 4 sets (Standard)
  
• Reactant: H2O
  
• Base Pressure: < 1E-3 Torr
  
• Pressure Control: Automatic Control by Throttle Valve
  
• Process Gauge: CDG Gauge (10 Torr)
  
• Process Pump: Dry Pump (Rotary Pump Available)
  
• Pumping Line Hot Trap to Reduce Particle