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By CN1

Supplier Info

Product Type:

Equipment


Application:

Deposition


Product Description:

Atomic Premium

Showerhead ALD reactor for wafer sizes up to 12″ and process temperatures up to 500°C. Excellent conformality and uniformity for a deep trench with high aspect ratio and complex 3D nano- & micro-structures.

 

Showerhead Type ALD Process

  • Substrate Size: 4–12” Standard (Wafer)
  • Thermal ALD Process (Plasma Process Available)
  • Chamber Material: anodized Al6061
  • Adjustable Gap between Showerhead and Substrate
  • Gas Delivery System: Bubbler, LDS, etc.
  • Max Temperature: 500(@ Wafer)
  • No. of Precursor Canisters: up to 4 sets (Standard)
  • Reactant: H2O
  • Base Pressure: < 1E-3 Torr
  • Pressure Control: Automatic Control by Throttle Valve
  • Process Gauge: CDG Gauge (10 Torr)
  • Process Pump: Dry Pump (Rotary Pump Available)
  • Pumping Line Hot Trap to Reduce Particle


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