Product Type:
Equipment
Application:
ALD
Product Description:
Atomic Mega
Furnace Type Batch ALD Process
- Vertical Furnace Type Batch ALD
- Substrate Size： 4 ~ 12” Standard (Wafer)
- Product Wafer : 25EA / 50EA / 75EA / 100EA
- Boat Slot Pitch : 10 ~ 15mm
- Boat Elevation System for Wafer Loading → Up / Down & Wafer Rotation
- Manual / Automatic Wafer Transfer
- Furnace Heater : Zone Temp Control
- Process Temp. : 100℃ ~ 350℃ / 400℃ ~ 800℃
- Ramping-Up : > 10 ℃/ min
- Ramping Down : 2 ~ 3.3 ℃/ min
- Furnace Port Shutter → Prevent the Heat from Furnace
- Base Pressure : < 1E-3 torr
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