Semiconductor / Mems

Atomic Classic

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By CN1

Supplier Info

Atomic Classic 960x720

Product Type:

Equipment

Application:

ALD

Product Description:

Atomic-Classic

Thermal ALD Process

Substrate Size : 4 ~ 8” Standard (Wafer)
Thermal ALD Process
Laminar Gas Flow (Side Gas Flow)
Gas Delivery System : Bubbler, LDS etc.
Low Particle Generation
Small Volume for Process
Available Laminated & Mixed Process
Easy User Interface & Maintenance
Max Temperature : 450 ℃ (@ Wafer)
No. of Precursor Canisters : Up to 4 Sets (Standard)

Specifications
Application
Video
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Semiconductor (DRAM, System LSI, etc)
Display (AMOLED, Micro-OLED, etc)
Photovoltaic (Si base PV & CIGS)
MEMS, Sensor, Battery, etc
Optical-, Bio-, Nano- and Flexible Devices

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Product Enquiry Form

Name*
First Last
Email*
Company Name*
Company Address*
Enquiry Details*
Product Name
Privacy*
- I have read and agree to the terms and conditions set out in the Privacy Policy
Name
This field is for validation purposes and should be left unchanged.