Atomic Classic

Product Enquiry

Product Enquiry Form

  • This field is for validation purposes and should be left unchanged.

By CN1

Supplier Info

Product Type:

Equipment


Application:

ALD


Product Description:

Atomic-Classic

Thermal ALD Process

  • Substrate Size : 4 ~ 8” Standard (Wafer)
  • Thermal ALD Process
  • Laminar Gas Flow (Side Gas Flow)
  • Gas Delivery System : Bubbler, LDS etc.
  • Low Particle Generation
  • Small Volume for Process
  • Available Laminated & Mixed Process
  • Easy User Interface & Maintenance
  • Max Temperature : 450 ℃ (@ Wafer)
  • No. of Precursor Canisters : Up to 4 Sets (Standard)


There are currently no specification available.

There are currently no downloads available.

There are currently no videos available.

  • Semiconductor (DRAM, System LSI, etc)
  • Display (AMOLED, Micro-OLED, etc)
  • Photovoltaic (Si base PV & CIGS)
  • MEMS, Sensor, Battery, etc
  • Optical-, Bio-, Nano- and Flexible Devices

  • This field is for validation purposes and should be left unchanged.

Product Enquiry Form

  • This field is for validation purposes and should be left unchanged.