Product Type:
Parts & Consumables
Application:
Cleaning Accessories
Product Description:
ScrubPADS® are patented wet-dry coated abrasives designed to clean residue, rust and by-product from process tools in semiconductor wafer fabs. ScrubPADS® are widely used in 200mm and 300mm fabs to PM or wet clean CVD, PECVD, dry etch, PVD and ion implant tools. ScrubPADS® are processed to be extremely low in metals and mobile ions and are available in a wide variety of diamond, silicon carbide and aluminum oxide abrasives to enable safe and efficient wet clean BKMs.
- Wide grit selection allows for quick removal of process-induced residue from aluminum, stain less steel, ceramic, glass, quartz and anodized surfaces while minimizing tool wear.
- The fiber-free construction of ScrubPADs greatly reduces particle levels in cleaned Tools.
- By using washed abrasives, harmful ionic residues are minimized.
- Unique bonding technology minimizes the release of abrasive particles leading to cleaner PM procedures.
- Enables the elimination of H2O2 from PMs, which greatly reduces recovery times.
- Clean and unload with UltraSOLV® Sponge for longer life.
| ScrubPADS Diamond Grit 0.78″ Thickness |
ScrubPADS Silicon Carbide (SiC) Grit 0.78″ Thickness |
ScrubPADS Aluminum Oxide (AO) Grit 0.78″ Thickness |
| HT4514D HT4518D HT4522D HT4528D HT4536D HT4536DS HT4540D HT4580D HT4513PDs HT4513PD HT4520PD HT4530PD |
HT4510 HT4510S HT4522 HT4528 HT4528-11 HT4540 HT4540S HT4560 HT4560S HT4580 HT4580-11 HT4512P HT4512PS HT4515P HT4540PD |
HT4580A HT4512PA HT4540PA |
file_downloadsrubpad-datasheet.pdf
Use these for PM or wet clean of your CVD, PECVD, dry etch, PVD and ion implant tools.