Atomic Mega

Product Enquiry

Product Enquiry Form

By CN1

Supplier Info

Product Type:

Equipment


Application:

ALD


Product Description:

Erhältlich für 4“ bis 12“ Wafer

  • Batch-Vertikalofen ALD
  • Substratgröße: 4 ~ 12” Wafer
  • Wafer pro Run: 25 EA / 50 EA (bis zu 100 EA)
  • Bootsschlitzabstand: 10 ~ 15 mm
  • Auf / Ab & Wafer-Rotation
  • Manuelle / automatischer Wafertransfer, -loading
  • Zonentemperaturregelung
  • Prozesstemperatur: 400 ~ 800 ° C.
  • Ramping-Up : > 10 ℃/min
  • Ramping-Down: 2 ~ 3,3 ℃ / min


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  • Semiconductor (DRAM, System LSI, etc)
  • Display (AMOLED, Micro-OLED, etc)
  • Photovoltaic (Si base PV & CIGS)
  • MEMS, Sensor, Battery, etc


Product Enquiry Form