Atomic Mega

Product Type:

Equipment

Application:

Deposition

Product Description:

Atomic Mega

 Furnace Type Batch ALD Process

• Vertical Furnace Type Batch ALD
  
• Substrate Size： 4–12” Standard (Wafer)
  
• Product Wafer: 25EA / 50EA / 75EA / 100EA
  
• Boat Slot Pitch: 10–15 mm
  
• Boat Elevation System for Wafer Loading → Up / Down & Wafer Rotation
  
• Manual / Automatic Wafer Transfer
  
• Furnace Heater: Zone Temp Control
  
• Process Temp.: 100–350℃ / 400–800℃
  
• Ramping-Up: > 10 ℃ / min
  
• Ramping Down: 2–3.3 ℃ / min
  
• Furnace Port Shutter → Prevents the Heat from Furnace
  
• Base Pressure: < 1E-3 torr