YM-S1-M Wafer Spin Cleaning Machine

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By NDS

Supplier Info

Product Type:

Equipment


Application:

Wet Processing


Product Description:

Manual PVA brush-based single-wafer cleaning equipment:

  • Able to process 3/4/6/8/12″ wafers
  • Wafer chucked by pin chuck or vacuum chuck
  • DIW based cleaning
  • Spot ultrasonic wave
  • PVA brush


  • Up to 2000 RPM
  • N2 blow
  • Clean Air blow
  • Class 100
  • Washing time about 2 min
  • Drying time about 10 s

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