by MILLICE
Image of two canisters with TruClean CL-300, a semi-aqueous cleaning solution engineered from Millice for advanced wafer surface and tool cleaning.

Chemicals & Photoresists, Wafer Handling

TruClean CL-300

A semi-aqueous cleaning solution engineered for advanced wafer surface and tool cleaning.

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by APPLIED QUANTUM MATERIALS INC.
Bottle of the photoresist H-SiOx from AQM. A high purity, silsesquioxane-based solid.

Chemicals & Photoresists

H-SiOx Resist

Negative photo- and electron-beam resist, specifically designed for nanolithography device fabrication.

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by MILLICE
Image of two different packaging options of KerfAid™ Dicing Fluid from Millice – a wafer-safe additive to DI water during the wafer-dicing process.

Chemicals & Photoresists, Sägen

KerfAid™ Dicing Fluid

The original dicing fluid is a wafer-safe additive to DI water during the wafer-dicing process.

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