by APPLIED QUANTUM MATERIALS INC.
Chemicals & Photoresists
H-SiOx Resist
Negative photo- and electron-beam resist, specifically designed for nanolithography device fabrication.
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APPLIED QUANTUM MATERIALS INC.
AQM specialize in the design, development, and manufacturing of silicon, carbon, and germanium nanomaterials — as well as their chemical precursors — to support advanced technology markets.