By EMCrafts
Supplier Info
Product Type:
Equipment
Application:
Scanning Electron Microscopy
Product Description:
K-1 Ion Sputter Coater is equipment that creates plasma on the surface of nonconductive and slightly conductive specimens to form metallic thin films and is a pre-treatment equipment that must be carried out when analyzing an electron microscope (SEM). The target is mostly gold(Au) or platinum(Pt), and depending on the condition of the specimen, the thickness can be changed by adjusting the current and time.
Key Features
- Minimize Footprint with Compact Product Size
- Fully automated operation by one button operation
- Large-area samples can also be coated uniformly and quickly
- Instant coating status check via LED indicator
- Adjustable sample height for optimal positioning
- Spacious chamber accommodates up to 19 sample holders.
- Built-in inert gas injection port allows for various coating targets
- Dual safety interlocks for high-voltage accident prevention and pump backflow prevention
| Vacuum Degree | 1.0~2.5 x 10-1 Torr |
| Ion Current | 10 to 70 mA |
| Target Material | Au or Pt |
| Chamber Size | Φ110 mm x 90 mm(H) |
| Sample Stage | Φ90 mm x 35 mm(H) |
| Adjustable height | 0~15 mm |
| Target Size | Φ57 mm (D) ⅹ 0.1 (T) |
| Sputter Time | 90 to 300 sec (1sec/step) |
| Vacuum Pump | 142 L/min, Rotary Pump |
| Dimension | Main Unit: 210(W) x 305(L) x 270(H) mm, 8 kg |
| Dimension | Rotary Pump: 338 (W) x 138 (D) x 244 (H) mm, 10.4 kg |
Rotary Pump: 338 (W) x 138 (D) x 244 (H) mm, 10.4kg
file_downloademcrafts-k1-ion-coater-datasheet.pdf
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- Metal thin film coating on the surface of nonconductive and slightly conductive specimens
- Metal thin film deposition such as Au and Pt by sputtering deposition method
- Micro structure Analysis or Failure Analysis (Broken Sections) (Materials and products such as semiconductor parts, ceramics, metals, powder, etc)