Autosamdri®-934

Product Type:

Equipment

Application:

CPD: Critical Point Dryer

Product Description:

• Process up to Five 4″ Wafers per Process Run
• Touchscreen Programmable Interface
• First Time Ever…Previous Run Data Review
• Integrated Chiller Loop Decreases LCO2 Consumption
• Easy Facilitation with Small Foot Print Design

• A dedicated initial Slow Fill into the process chamber allows ideal fluid dynamics preserving the most sensitive micro devices.
• Maintenance made easy via accessible components including the external Post-Purge-Filter assembly.
• Patent Pending “Vortex Swirl”: Non-mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices.
• Extremely Efficient integrated Closed Cooling Loop dropping chamber temperature quickly for shorter process run times.
• The internal SOTER(tm) condenser quietly captures and separates CO2 exhaust and waste alcohols.
• Our original Chamber Inserts enable chamber I.D. variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
• Process chamber LCO2 filtration down to 0.08µm with 99.999%+ particle retention.
• Processes up to five 4″ wafers each run. Included are the following HF Compatible Wafer Holders: 4″, 3″, 2″ and 10mm Die Holders.
• Chamber Illumination via viewing window facilitates chamber status visualization.
• Automatic process with factory default recipe or the ability to customize your own!
• All internal surfaces are inert to CO2 and ultrapure alcohols.
• Repeatable operating parameters insuring “reproducibility” of results.
• Safety operation features integrated into both temperature and pressure automatic regulation.
• All electronic components meet CE, UL and/or U.S. Military Specifications.
• Clean room static-free compatible design.