Semiconductor / Mems

Atomic Basic

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By CN1

Supplier Info

Atomic Basic 960x720

Product Type:

Equipment

Application:

ALD

Product Description:

Atomic Basic

Compact reactor Thermal ALD

Compact ALD Model
Thermal ALD
Wafer Size : ≤ 6″ Wafer
Process temperature : up to 250°C
Applications : Oxide Film(Al₂O₃), etc
Very small Volume for process

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Application
Video
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Semiconductor (DRAM, System LSI, etc)
Display (AMOLED, Micro-OLED, etc)
Photovoltaic (Si base PV & CIGS)
MEMS, Sensor, Battery, etc
Optical-, Bio-, Nano- and Flexible Devices

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Product Enquiry Form

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Product Name
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Comments
This field is for validation purposes and should be left unchanged.